Traditionally, cleaning processes involve the application of wet chemical techniques which mostly consists of using aqueous surfactant solutions. These techniques are used to rid a surface of contaminants that may be organic or inorganic in nature along with acids that are used to define bonding surfaces and cleaning assistance.
Sadly, using aggressive surfactants and water that’s de-ionized and highly purified for rinsing, does not clean the contaminated surfaces completely. That’s because the chemicals and acids used for cleaning the surface only replace the contaminants with their own residue. Therefore, to overcome this problem without causing much damage to the surface, cleaning plasma is used for ultra-fine cleaning of ceramics, metals, and other such materials involving a critical surface condition.
Cleaning plasma is used for surface preparation by clearing the surface of residues of mineral oil or contaminants that are far more organic in nature. This leads to the improvement of the surface’s quality on the whole along with being environmentally friendly and essentially dry in comparison with cleaning based solely on aqueous or solvents.
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